Custom designed optics for EUV and X-ray sources
Single wavelength Confocal Max-Flux (CMF) optics for single crystal diffraction
Dual wavelength Confocal Max-Flux (CMF) optics for single crystal X-ray diffraction
Multilayer optics for extreme UV lithography patterning of semiconductor wafers
Custom focusing CMF X-ray optics for X-ray diffraction
Special CMF optic designed for SAXS instrumentation
Parallel beam graded multilayer monochromator for XRD
Focusing graded multilayer monochromator for TXRF