Every aspect of modern life benefits from coating or thin film technology. Whether analyzing a barrier layer film in an integrated circuit chip or a conversion coating on an aluminum beverage can, X-ray analytical techniques are integral to R&D, production process control and quality assurance of such materials. Composition and structure of coatings, thin films, multilayers, materials, solar cells, batteries, semiconductors, nanomaterials and many other materials can be analyzed by X-ray fluorescence (XRF) to determine the thickness and elemental composition in metrology. XRT (X-ray topography) can be employed to investigate crystalline defects and X-ray Reflectometry (XRR) to measure layer thicknesses, roughness and interlayer diffusion. Emerging as a leading enabler for such thin film and nanotechnology research, X-ray diffraction (XRD) and associated diffuse scattering methods like SAXS examine the nature of the molecular structure of films, coatings and layers or particles in biology, chemistry, physics, and engineering. Rigaku’s advanced technology and experience provide a variety of non-destructive and state-of-the-art analytical solutions and service.
Application Notes
The following application notes are relevant to this industryX-ray CT, Computed tomography
Rigaku recommends the following systems:
WDXRF
Benchtop tube below sequential WDXRF spectrometer analyzes O through U in solids, liquids and powders
High power, tube above, sequential WDXRF spectrometer with new ZSX Guidance expert system software
High-throughput tube-above multi-channel simultaneous WDXRF spectrometer analyzes Be through U
High-power, tube-below, sequential WDXRF spectrometer with new ZSX Guidance expert system software
Single crystal
Our most popular diffractometer for Chemical Crystallography and Mineralogy, configured with either single or dual microfocus sealed tube X-ray sources and an extremely low noise direct X-ray detection detector.
A benchtop single crystal X-ray diffractometer ideal for chemical crystallography and teaching.
An entry-level single crystal X-ray diffractometer for Chemical Crystallography configured with microfocus sealed tube technology and a direct X-ray detection detector.
Our most popular diffractometer for Protein Crystallography, configured with a high-flux rotating anode X-ray source and an extremely low noise direct X-ray detection detector.
Spectacular performance combined with dual wavelength versatility, provides the perfect answer for high-capacity Chemical Crystallography labs or for X-ray facilities that support Chemical Crystallography and Protein Crystallography.
A bespoke, extremely high-flux diffractometer with custom enclosure and the flexibility to utilize both ports of the rotating anode X-ray source.
A new and fully integrated electron diffractometer for measuring submicron crystals, utilizing a seamless workflow from data collection to structure determination of crystal structures
XRD
New 6th-generation general purpose benchtop XRD system for phase i.d and phase quantification
Advanced state-of-the-art high-resolution XRD system powered by Guidance expert system software
High-performance, multi-purpose XRD system for applications ranging from R&D to quality control
Stress
Laboratory micro-spot XRD residual stress analysis with both iso- and side-inclination methods
EDXRF
Low-cost EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin-films
Performance EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin-films
High-performance, Cartesian-geometry EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin films
SAXS
A modernized 2D Kratky system that eliminates data corrections required of traditional systems
X-ray CT
X-ray topography (XRT)
A fast, high-resolution laboratory X-ray topography system for non-destructive dislocation imaging
Semiconductors
In-line, simultaneous WDXRF spectrometer for wafer metal film metrology; up to 300 mm wafers
Sequential WDXRF spectrometer for elemental analysis and thin-film metrology of large and/or heavy samples
Process XRR, XRF, and XRD metrology tool for blanket and patterned wafers; up to 300 mm wafers
Ultra-trace elemental surface contamination metrology by TXRF with VPD capability; up to 300 mm wafers
This versatile X-ray metrology tool enables high-throughput measurements on blanket wafers ranging from ultra-thin single-layer films to multilayer stacks for process development and film quality control.