TFXRD-200
X-ray Diffraction Analysis (XRD) System for Up to 200 mm Wafer Full Mapping
The TFXRD-200 is a dedicated XRD tool designed for the measurement of thin films on large-diameter wafers and measures the film thickness, the crystal quality, the composition ratio of the compound material, and relaxation of the epitaxial wafers, etc.
TFXRD-200 Overview
High-precision goniometer with selectable optics
XRD System for all thin film XRD applications and XY movable stage for mapping up to 300 mm wafers.
The system guarantees that your samples will remain intact, ensuring you can conduct further experimentation and analysis without any issues. Trust us to provide the most precise and reliable results for all your research and development needs.
XRD system mapping tool for Near-fab applications
Improve materials analysis, enhanced quality control, and optimized manufacturing processes.
Thin films
- Precise thickness and composition
- Crystallographic information
- Stress and strain analysis
- Non-destructive characterization
- Multilayer analysis
- Advanced material development
Specialized for XRR thickness
Determine the thickness, density, and interface roughness of thin films, coatings, and multilayer structures.
GaAs (004), cubic GaN (002), hexagonal GaN (0004) specialized evaluation
Precise analysis of the crystallographic orientations and control the growth and processing of materials to achieve desired performance in electronic and optoelectronic devices.
TFXRD-200 Features
TFXRD-200 Specifications
| Technique | X-ray diffraction (XRD), rocking curve (XRC), and reflectometry (XRR) | |
|---|---|---|
| Benefit | High-precision goniometer with full mapping XY-stage for 200 mm wafers | |
| Technology | High-precision θ-2θ horizontal goniometer with large cradle | |
| Attributes | Blanket wafer metrology Up to 200 mm wafer full mapping XY stage |
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| Options | PhotonMax high-flux 9 kW rotating anode X-ray source Confocal Max-flux 800 W rotating anode X-ray source HyPix-3000 high energy resolution 2D HPAD detector |
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| Computer | External PC, MS Windows OS, SmartLab Studio II software | |
| Dimensions | Approx. 1900 (W) x 2200 (H) x 1900 (D) mm | |
| Mass | Approx. 1600 kg | |
| Power requirements | 3Ø, 200 V 50/60 Hz, 30 A (sealed tube) or 60 A (9 kW rotating anode) | |
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