Rigaku Innovative Technologies

Rigaku Innovative Technologies (RIT), formerly known as Osmic Optics, is an optics division of Rigaku. RIT is a global supplier of high-performance multilayer optics used in commercial and academic institutions and government research facilities. RIT has sold over 40,000 multilayers worldwide, all of which have been integrated into most major brands of wavelength dispersive X-ray spectrometers, X-ray diffractometers, X-ray crystallography, and SAXS/WAXS analytical instruments or in use on a synchrotron or XFEL beamline.

rit-offices

Committed to the best optics and relentless innovation

For nearly 40 years, we've been engineering the industry's finest multilayer mirrors to meet diverse requirements and continuously improve their performance through innovation.

Decades of experience

With nearly 40 years of expertise, we lead the industry in multilayer mirror technology, pushing the boundaries of X-ray optics.

Atomic precision

It is crucial to control every detail of our optics—layer thickness, curvature, and roughness—at the atomic level to ensure the best performance and reliability. It is precisely what we do with our optics.

Custom design

If you don't see the right optics that meet your requirements, we can design custom optics tailored to your unique and innovative needs.

Products

What is a multilayer optic?

A multilayer optic is produced by depositing alternating layers of light-element- and heavy-element-containing materials onto a substrate. The layer thickness acts like the d spacing in a crystal in the sense that X-rays impinging on a multilayer optic at the proper θ angle will produce a monochromatic diffracted X-ray beam. If the layer thickness is varied across a pre-curved substrate, a graded optic can be produced that captures a larger angle of X-rays from the source and produces either a focused or parallel beam.

Rigaku's products enable improvements in instrumentation and materials used by many industries to better their products.  For example, we produce extreme ultraviolet (EUV) multilayers and coatings for optics to support the continued scaling of computer chip circuitry. We also offer single film, multilayer and crystal optics for synchrotron beamlines and end-stations. Coatings can be made on customer-furnished substrates or on new substrates we provide.

Where our optics are used:

  • In X-ray fluorescence (XRF) instruments to determine the amounts of or types of elemental compounds within a given sample
  • In X-ray diffraction (XRD) instruments to determine the atomic structure within a given sample
  • In various X-ray analytical instruments to control or manipulate the angular divergence, energy range, and beam size of X-rays.

Services include

  • Multilayer coatings for various custom applications
  • Advanced coatings services for many types of sputtered films
  • High precision Johansson monochromator crystals
  • X-ray sources and systems
  • Extreme ultraviolet lithography (EUVL) collectors, illumination, imaging and metrology optics
  • Extreme ultraviolet or EUV-XUV for precision diffractive optics for multidisciplinary studies and astronomical research
  • X-ray crystallography for determining atomic structure of a crystal or macromolecule
  • Small angle X-ray scattering (SAXS) for studying materials with long-range order such as polymers, nanoparticles in solution, proteins in solution and so on.

Suite of products includes

  • Spectroscopy analyzers
  • Diffraction monochromators and analyzers
  • Point-to-point focusing optics
  • Point-to-line focusing optics
  • Collimating optics
  • Area-to-point focusing optics
  • Multilayers as double multilayer monochromator (DMM) sets, offering high flux and a broad range of energy selectivity

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