High-resolution X-ray Diffraction

    High-resolution X-ray diffraction (HRXRD) is a powerful technique used for research and manufacturing of semiconductors. It has several advantages such as assessing crystal quality, analyzing layer thickness and composition, evaluating interface quality, analyzing strain, optimizing processes, detecting and analyzing defects, developing advanced materials, and quality control in manufacturing. HRXRD plays a vital role in advancing semiconductor technology.

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    HRXRD metrology solutions

    From lab to fab

    XTRAIA XD sERIES
    XTRAIA XD series

    HR-XRD and XRR. Strain, composition, and thickness of epitaxial layers, crystalline phase, and texture of polycrystalline films. Thin film and film stack thicknesses and density.

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    NEAR FAB TOOLS – 1
    TFXRD series

    In-line monitoring and control using X-ray diffraction for analyzing thin film properties.

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    HRXRD advantages

    Crystal quality assessment

    Characterize crystal quality, including crystal structure, lattice parameters, and crystal defects.

    Layer thickness and composition analysis

    Determine layer thicknesses and compositions in semiconductor heterostructures, including epitaxial layers and multilayer structures.

    Strain analysis

    Analyze strain with high sensitivity in semiconductor materials to improve carrier mobility in field-effect transistors (FETs) and enhance the efficiency of optoelectronic devices.

    Interface quality evaluation

    Provide insights into the quality of interfaces between different semiconductor layers

    Defect analysis and detection

    Identify and characterize various types of defects in semiconductor materials, including threading dislocations, stacking faults, and point defects.

    Advanced material development

    Develop avanced semiconductor materials, such as III-V compound semiconductors and wide-bandgap materials for next-generation devices.

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