XHEMIS TX-3000
TXRF Spectrometer
Ultrahigh-speed metal contamination mapping
For up to 300 mm wafers.
XHEMIS TX-3000 Overview
Detection Limit of typical elements (LLD）
| Detection limit LLD (E10 atoms/cm²) | Al | Fe | Ni | Cu |
| TXRF | 14 | 0.06 | 0.06 | 0.09 |
Measurement time: 1000 sec
XHEMIS TX-3000 Specifications
| Technique | Total Reflection X-ray Fluorescence (TXRF) | |
|---|---|---|
| Benefit | Rapid, non-destructive measurement of trace elemental surface contamination (Na – U) ~ 3x improvement in mapping speed E9 atoms/cm² detection limit |
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| Technology | High-sensitivity metal contamination analysis. | |
| Attributes | Three-detector configuration High-power W-anode X-ray source (9 kW rotating anode) Three excitation energies optimized for light, transition, and heavy elements XYθ sample stage Dual FOUP load ports |
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| Features | Full wafer mapping (SWEEPING-TXRF) Zero edge exclusion (ZEE-TXRF) |
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| Options | Backside analysis (BAC-TXRF) GEM300 software, E84/OHT support |
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| Dimensions | 1280 (W) x 3750 (D) x 2040 (H) (Excluding monitor and signal tower) |
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| Measurement results | Quantitative result, spectrum chart, color contour map, mapping table | |
XHEMIS TX-3000 Events
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