XTRAIA XD-2000-R

Non-destructive X-ray reflectometry metrology tool for multilayer films, EUV masks, and advanced thin-film applications

  • Characterizes multilayer thickness and density
  • Sub-nanometer precision for surface/interface roughness
  • Automated and non-destructive workflow
  • Designed for semiconductor and photomask applications

The XTRAIA XD-2000-R is a precision metrology system that employs X-ray reflectometry (XRR) to measure thin-film properties with exceptional accuracy. It is purpose-built for evaluating multilayer structures in EUV masks and advanced thin films used in semiconductor manufacturing. The tool offers sub-nanometer resolution and supports sample mapping over a large area.

Fully automated and equipped with advanced optical components, the XD-2000-R delivers fast, reliable results for quality assurance and process development environments.

XTRAIA XD-2000-R

XTRAIA XD-2000-R Overview

The XTRAIA XD-2000-R is a high-precision metrology system designed for advanced X-ray reflectometry (XRR) measurements. It offers unmatched accuracy in film thickness, density, and surface/interface roughness analysis. It is specifically engineered for semiconductor and EUV mask applications and is ideal for multilayer film characterization in environments demanding high throughput and detailed analysis.

XTRAIA XD-2000-R Features

Measures film thickness, density, and surface/interface roughness
Compatible with EUV masks (SEMI P37/P38-1102)
Thickness range: 1–400 nm
Cross-sectional X-ray beam size: 0.1 mm × 10 mm or larger
Mapping within a 100 mm radius
Automated recipe-driven operation with laser-based alignment
Optional multi-angle and extended-depth analysis

XTRAIA XD-2000-R Specifications

Technique High-resolution X-ray reflectometry (HRXRR)
Sensitivity Sub-nanometer scale
Sample compatibility EUV masks, SMIF-compatible formats
Measurement items Film thickness, density, interface roughness
Resolution Sub-nanometer vertical resolution
Benefit Accurate multilayer and interface characterization
Automation Fully automated with recipe setup
Technology Goniometer with HyPix detector and multilayer optics
Compliance GEM300, SEMI S2/S8, CE, NFPA, EU directives
Throughput Approx. 15 minutes per measurement point
Core attributes Non-destructive analysis, advanced data interpretation
Core features Precise film metrology, roughness profiling
Options Multi-angle XRR, extended mask handling, advanced software
Measurement results Reflectometry profiles, thickness, roughness, density

XTRAIA XD-2000-R Options

  • Multi-angle reflectometry
  • Custom detectors
  • Environmental control modules
  • Extended mask support

The following accessories are available for this product:

XTRAIA XD-2000-R Events

Learn more about our products at these events

  • SPIE Advanced Lithography + Patterning
    February 22 2026 - February 26 2026
    San Jose, CA, USA 
  • Florida Semiconductor Summit
    February 23 2026 - February 25 2026
    Orlando, FL, USA
  • Rigaku Taiwan professional training courses (SCX)
    February 26 2026 - February 26 2026
    Rigaku Taiwan (RTC-TW)
  • JSAP Spring Meeting 2026
    March 15 2026 - March 16 2026
    Tokyo, Japan
  • The 2026 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) Platinum Sponsors
    March 16 2026 - March 19 2026
     Monterey, CA ,USA
  • SEMICON China 2026
    March 25 2026 - March 27 2026
    SNIEC, Shanghai, China
  • Rigaku Taiwan professional training courses (XRD)
    March 27 2026 - March 27 2026
    Rigaku Taiwan (RTC-TW)
  • CS International 2026
    April 20 2026 - April 22 2026
    Brussels, Belgium
  • SEMICON SEA 2026
    May 5 2026 - May 7 2026
    Kuala Lumpur, Malaysia
  • ASMC – Advanced Semiconductor Manufacturing Conference
    May 11 2026 - May 14 2026
    Albany, NY, USA
  • WOCSDICE/EXMATEC 2026
    May 24 2026 - May 28 2026
    Gdańsk, Poland
  • The 2026 IEEE 76th Electronic Components and Technology Conference
    May 26 2026 - May 29 2026
    Orlando, Fl, USA
  • CEIA Leti Innovation Days
    June 23 2026 - June 25 2026
    Maison Minatec, Grenoble, France 
  • The International Workshop on Gallium Oxide and Related Materials (IWGO-6)
    August 2 2026 - August 7 2026
     College Park, MD, USA.
  • SEMICON Taiwan 2026
    September 2 2026 - September 4 2026
    Taipei, Taiwan
  • ICSCRM Japan 2026 (Silver Sponsor)
    September 27 2026 - October 2 2026
    Yokohama, Japan
  • SEMICON West 2026
    October 13 2026 - October 15 2026
    San Francisco, CA, USA 
  • SEMICON Europa
    November 10 2026 - November 13 2026
    Munich, Germany
  • SEMICON Japan 2026
    December 9 2026 - December 11 2026
    Tokyo, Japan

Contact Us

Whether you are interested in getting a quote, want a demo, need technical support, or simply have a question, we're here to help.