XTRAIA XD-2000-R
Non-destructive X-ray reflectometry metrology tool for multilayer films, EUV masks, and advanced thin-film applications
- Characterizes multilayer thickness and density
- Sub-nanometer precision for surface/interface roughness
- Automated and non-destructive workflow
- Designed for semiconductor and photomask applications
The XTRAIA XD-2000-R is a precision metrology system that employs X-ray reflectometry (XRR) to measure thin-film properties with exceptional accuracy. It is purpose-built for evaluating multilayer structures in EUV masks and advanced thin films used in semiconductor manufacturing. The tool offers sub-nanometer resolution and supports sample mapping over a large area.
Fully automated and equipped with advanced optical components, the XD-2000-R delivers fast, reliable results for quality assurance and process development environments.
XTRAIA XD-2000-R Overview
The XTRAIA XD-2000-R is a high-precision metrology system designed for advanced X-ray reflectometry (XRR) measurements. It offers unmatched accuracy in film thickness, density, and surface/interface roughness analysis. It is specifically engineered for semiconductor and EUV mask applications and is ideal for multilayer film characterization in environments demanding high throughput and detailed analysis.
XTRAIA XD-2000-R Features
XTRAIA XD-2000-R Specifications
| Technique | High-resolution X-ray reflectometry (HRXRR) | |
|---|---|---|
| Sensitivity | Sub-nanometer scale | |
| Sample compatibility | EUV masks, SMIF-compatible formats | |
| Measurement items | Film thickness, density, interface roughness | |
| Resolution | Sub-nanometer vertical resolution | |
| Benefit | Accurate multilayer and interface characterization | |
| Automation | Fully automated with recipe setup | |
| Technology | Goniometer with HyPix detector and multilayer optics | |
| Compliance | GEM300, SEMI S2/S8, CE, NFPA, EU directives | |
| Throughput | Approx. 15 minutes per measurement point | |
| Core attributes | Non-destructive analysis, advanced data interpretation | |
| Core features | Precise film metrology, roughness profiling | |
| Options | Multi-angle XRR, extended mask handling, advanced software | |
| Measurement results | Reflectometry profiles, thickness, roughness, density | |
XTRAIA XD-2000-R Options
- Multi-angle reflectometry
- Custom detectors
- Environmental control modules
- Extended mask support
The following accessories are available for this product:
XTRAIA XD-2000-R Events
Learn more about our products at these events
-
EventDatesLocationEvent website
-
JSAP Autumn EXPOSeptember 6 2025 - September 9 2025Nagoya, Japan
-
The 86th JSAP Autumn Meeting 2025September 6 2025 - September 9 2025Tokyo, Japan
-
SEMICON TaiwanSeptember 9 2025 - September 11 2025Taipei, Taiwan
-
EMRS Fall meeting 2025September 14 2025 - September 17 2025Warsaw, Poland
-
International Conference on Silicon Carbide and Related Materials (ICSCRM 2025)September 15 2025 - September 18 2025Busan, Korea
-
SEMICON JapanDecember 1 2025 - December 2 2025Tokyo, Japan
Contact Us
Whether you are interested in getting a quote, want a demo, need technical support, or simply have a question, we're here to help.