TFXRD Lab

High-precision thin film XRD for advanced research

The Rigaku TFXRD Lab delivers lab-grade precision for the non-destructive analysis of thin films, multilayers, and coatings. Designed for materials research laboratories working on thin films, multilayers, and coatings for next-generation electronic and photonic devices, this system features a high-precision goniometer with selectable optics and an XY-movable stage for mapping wafers up to 300 mm in diameter. With high-resolution measurements, flexible configuration, and exceptional sample integrity, the TFXRD Lab empowers scientists and engineers to accelerate materials discovery, optimize growth processes, and enhance device performance.

Available models:

TFXRD Lab 200: Supports wafers up to 200 mm
TFXRD Lab 300: Supports wafers up to 300 mm

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TFXRD Lab Overview

High-precision goniometer with selectable optics

XRD System for all thin film XRD applications and XY movable stage for mapping up to 300 mm wafers.

The system guarantees that your samples will remain intact, ensuring you can conduct further experimentation and analysis without any issues. Trust us to provide the most precise and reliable results for all your research and development needs.

XRD system mapping tool for Near-fab applications

Improve materials analysis, enhanced quality control, and optimized manufacturing processes.

Thin films

Precise thickness and composition
Crystallographic information
Stress and strain analysis
Non-destructive characterization
Multilayer analysis
Advanced material development

Specialized for XRR thickness

Determine the thickness, density, and interface roughness of thin films, coatings, and multilayer structures.

GaAs (004), cubic GaN (002), hexagonal GaN (0004) specialized evaluation

Precise analysis of the crystallographic orientations and control the growth and processing of materials to achieve desired performance in electronic and optoelectronic devices.

TFXRD Lab Features

High-precision goniometer with selectable optics for all thin film XRD applications

XY-movable stage enabling high-resolution mapping across the entire wafer surface

Efficient measurement speed to accelerate research and development workflows

Incident beam monochromator for ultra-high-resolution measurements

Large wafer compatibility supports full-area mapping of wafers up to 300 mm

TFXRD Lab Specifications

Technique	High-resolution thin film X-ray diffraction (HR-XRD) and X-ray reflectivity (XRR)
Purpose	Non-destructive structural analysis of thin films, multilayers, and coatings for R&D applications
Technology	High-precision θ-2θ goniometer with selectable optics and XY-movable stage for wafer mapping
Key components	High-brilliance X-ray source; precision XRD optics; high-resolution 2D detector; enclosed cabinet
Options	XRR module, automated mapping software, specialized analysis packages (GaAs, GaN, etc.)
Wafer transfer / Sample handling	Manual wafer loading with XY stage (supports up to 300 mm wafers)