TFXRD-300

High-precision goniometer with selectable optics

 XRD System for all thin film XRD applications and XY movable stage for mapping up to 300 mm wafers.

The system guarantees that your samples will remain intact, ensuring you can conduct further experimentation and analysis without any issues. Trust us to provide the most precise and reliable results for all your research and development needs.

XRD system mapping tool for Near-fab applications

Improve materials analysis, enhanced quality control, and optimized manufacturing processes.

Thin films

• Precise thickness and composition
• Crystallographic information
• Stress and strain analysis
• Non-destructive characterization
• Multilayer analysis
• Advanced material development

Specialized for XRR thickness

Determine the thickness, density, and interface roughness of thin films, coatings, and multilayer structures. 

GaAs (004), cubic GaN (002), hexagonal GaN (0004) specialized evaluation

Precise analysis of the crystallographic orientations and control the growth and processing of materials to achieve desired performance in electronic and optoelectronic devices.