EDXRF, XRD, and XRR Metrology

EDXRF, XRR, and XRD for the characterization of ultrathin multilayer samples, blanket and/or patterned wafers.
Semicondcutor_Wafer _AS_338899292
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EDXRF, XRD, and XRR metrology solutions

EDXRF, XRR, XRD and Optical Techniques.Typically for characterization of multilayered samples for BEOL and advanced packaging applications.

XTRAIA MF-2000 400x300-1
XTRAIA MF-2000

Process XRR, EDXRF, and XRD Metrology Fab Tool for Blanket and patterned metal layer thickness and composition

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XTRAIA MF-3000 400x300
XTRAIA MF-3000

XRR, EDXRF, XRD Metrology Optimized for High-Volume Manufacturing for Blanket and patterned metal layer thickness and composition.

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XHEMIS EX-2000 400x300
XHEMIS EX-2000

EDXRF and XRR for High-Volume Manufacturing for Thickness, density, roughness, and composition of films on blanket wafers metrology tool for blanket wafers ≤200 mm.

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Hybrid wafer metrology

The ONYX Series is a cutting-edge wafer metrology tool that combines advanced X-ray and optical techniques. It offers a unique approach to metrology in several areas from FEOL through WLP, leading to in-line solutions for these processes. This sophisticated hybrid metrology tool enables high-throughput, in-line measurements on both blanket and product wafers, ranging from ultra-thin single-layer films to multi-layer stacks. It combines micro-spot ED-XRF and 2D microscope with a 3D scanner, allowing for in-line, non-destructive inspection and metrology.

ONYX 3000 400x300
ONYX 3000

Micro-spot EDXRF and optical inspection (2D-3D). Iin-line non-destructive inspection and metrology for the semiconductor and micro-electronics industries ≤300 mm wafers

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ONYX 3000 400x300
ONYX 3200

Single μ-bump measurements for process monitoring. High yield and improved throughput. Accurate analysis for metal thickness and composition. Maximum sensitivity for layer thickness and composition

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