EDXRF, XRD, and XRR Metrology
EDXRF, XRD, and XRR metrology solutions
EDXRF, XRR, XRD and Optical Techniques.Typically for characterization of multilayered samples for BEOL and advanced packaging applications.
XTRAIA MF-2000
Process XRR, EDXRF, and XRD Metrology Fab Tool for Blanket and patterned metal layer thickness and composition
Learn more >XTRAIA MF-3000
XRR, EDXRF, XRD Metrology Optimized for High-Volume Manufacturing for Blanket and patterned metal layer thickness and composition.
Learn more >XHEMIS EX-2000
EDXRF and XRR for High-Volume Manufacturing for Thickness, density, roughness, and composition of films on blanket wafers metrology tool for blanket wafers ≤200 mm.
Learn more >Hybrid wafer metrology
The ONYX Series is a cutting-edge wafer metrology tool that combines advanced X-ray and optical techniques. It offers a unique approach to metrology in several areas from FEOL through WLP, leading to in-line solutions for these processes. This sophisticated hybrid metrology tool enables high-throughput, in-line measurements on both blanket and product wafers, ranging from ultra-thin single-layer films to multi-layer stacks. It combines micro-spot ED-XRF and 2D microscope with a 3D scanner, allowing for in-line, non-destructive inspection and metrology.
ONYX 3000
Micro-spot EDXRF and optical inspection (2D-3D). Iin-line non-destructive inspection and metrology for the semiconductor and micro-electronics industries ≤300 mm wafers
Learn more >ONYX 3200
Single μ-bump measurements for process monitoring. High yield and improved throughput. Accurate analysis for metal thickness and composition. Maximum sensitivity for layer thickness and composition
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