Understanding Semiconductors
Episode 13
Modern metrology from Lab to Fab by Rigaku
A podcast for engineering leaders in characterization, metrology, process, and analytics, looking for discussion around semiconductor metrology challenges.
In this episode, semiconductor secrets unveiled: Navigating atom probe tomography with David Larson
Ever wondered how atom probe tomography advances our understanding of semiconductors and improves device performance?
In today's episode, we dive deep into the world of semiconductors as we explore the fascinating realm of atom probe tomography. Our guest expert, David Larson, sheds light on the intricacies of this powerful materials characterization technique. From minimizing damage and improving yield to overcoming challenges in data reconstruction, David shares insights on the latest advancements and future possibilities in the field. Tune in to gain a deeper understanding of semiconductors and atom probe technology's role in their analysis.
Explore:
- The use of a Focused Ion Beam (FIB) at liquid nitrogen temperature to minimize damage and improve yield
- Challenges of yield and spatial distortion in atom probe technology
- How different laser wavelengths can enhance reconstruction and yield in heterogeneous structures
- How modeling and in situ measurements play a crucial role in predicting the field of operation
- The limitations, growth, and future improvements of atom probe technology, including its application in analyzing real devices
Visit our LinkedIn Semiconductor Metrology Solutions Showcase
Contact Markus Kuhn on LinkedIn for any potential guest requests or episode ideas.
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Host: Markus Kuhn
Ph.D. in Chemistry, University of Western Ontario, Canada BS Honors, University of Western Ontario, Canada. Markus is a semiconductor technology expert with a proven track record in developing, managing, and implementing novel metrology strategies and programs in support of advanced semiconductor process and architectural technology development. During a 25-year career with Intel and Digital Equipment Corporation, Markus was responsible for the development and implementation of a broad range of analytical capabilities to help meet semiconductor technology goals and was a key technical contributor to Intel's breakthrough strain, high K/metal gate, FinFET, and advanced memory programs. Currently, he is a Senior Director for Semiconductor Technology and a Fellow for Rigaku Corporation. His interests include the advancement of analytical capabilities for nanoscale devices, and he has a broader interest in the synergies between analytical characterization methods, machine learning, and process metrology to help enable emerging nanoscale device technologies. He has published 100+ refereed papers and holds 30+ patents relating to semiconductor technology. 
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