XHEMIS TX-3000

TXRF Spectrometer

For up to 300 mm wafers.

Detection Limit of typical elements (LLD）

Detection limit LLD (E10 atoms/cm²)	Al	Fe	Ni	Cu
TXRF	25	0.1	0.1	0.15

Measurement time: 1000 sec

Technique	Total Reflection X-ray Fluorescence (TXRF)
Benefit	Rapid, non-destructive measurement of trace elemental surface contamination (Na – U) ~ 3x improvement in mapping speed E9 atoms/cm² detection limit
Technology	High-sensitivity metal contamination analysis.
Attributes	Three-detector configuration High-power W-anode X-ray source (9 kW rotating anode) Three excitation energies optimized for light, transition, and heavy elements XYθ sample stage Dual FOUP load ports
Features	Full wafer mapping (SWEEPING-TXRF) Zero edge exclusion (ZEE-TXRF)
Options	Backside analysis (BAC-TXRF) GEM300 software, E84/OHT support
Dimensions	1280 (W) x 3750 (D) x 2040 (H) (Excluding monitor and signal tower)
Measurement results	Quantitative result, spectrum chart, color contour map, mapping table

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