TXRF 310Fab
High-speed metal contamination mapping for up to 300 mm wafers
Measurement of trace elemental surface contamination
Total reflection X-ray fluorescence (TXRF) analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF 310Fab can measure elements from Na through U with a single-target, 3-beam X-ray system and a liquid nitrogen-free detector system.
TXRF 310Fab Overview
The TXRF 310Fab includes Rigaku's patented XYθ sample stage system, an in-vacuum wafer robotic transfer system, and new user-friendly windows software. These contribute to higher throughput, accuracy and precision, and easy routine operation.
Optional Sweeping TXRF software enables mapping of the contaminant distribution over the wafer surface to identify "hot spots" that can be automatically re-measured at higher precision.
Detection limit of typical elements (LLD)
Detection limit LLD (E10 atoms/cm²) | Na | Al | Fe | Ni | Cu |
25 | 25 | 0.1 | 0.1 | 0.15 |
Options
- ZEE-TXRF capability overcomes the historical 15 mm edge exclusion of original TXRF designs, enabling measurements to be made with zero edge exclusion.
- BAC-TXRF capability enables fully-automated front-side and back-side TXRF measurements of 300 mm wafers with non-contacting wafer flipping.
TXRF 310Fab Features
TXRF 310Fab Specifications
Technique | Total reflection X-ray fluorescence (TXRF) | |
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Benefit | Rapid, non-destructive measurement of trace elemental surface contamination (Na – U) | |
Technology | Three-beam TXRF system with electronically-cooled detector, and automatic optics exchange | |
Attributes | Three-detector configuration High-power W-anode X-ray source (9 kW rotating anode) Three excitation energies optimized for light, transition, and heavy elements XYθ sample stage Dual FOUP load ports |
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Features | Full wafer mapping (SWEEPING-TXRF) Zero edge exclusion (ZEE-TXRF) |
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Options | FOUP, SMIF, and through-the-wall configurations Backside analysis (BAC-TXRF) GEM300 software, E84/OHT support |
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Dimensions | 1200 (W) x 2050(H) x 2546 (D) mm | |
Measurement results | Quantitative result, spectrum chart, color contour map, mapping table |
TXRF 310Fab Application Notes
TXRF 310Fab Resources
Webinars
Total Reflection X-ray Fluorescence (TXRF) for Semiconductor Manufacturing | Watch the Recording |
TXRF 310Fab Events
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