X-ray Metrology Solutions Virtual Catalog

Total reflection X-ray fluorescence (TXRF):

Our TXRF systems provide highly sensitive elemental analysis for semiconductor materials. With exceptional accuracy and precision, these tools enable you to analyze trace contaminants and monitor elemental composition with unparalleled reliability.

Wavelength dispersive X-ray fluorescence (WDXRF):

Our WDXRF instruments offer rapid, non-destructive analysis of thin films and coatings. From layer thickness measurement to elemental analysis, these systems deliver precise results for process control and quality assurance in semiconductor manufacturing.

Energy dispersive X-ray fluorescence (EDXRF):

Our EDXRF analyzers provide fast and accurate analysis of elemental composition in a wide range of semiconductor materials. With user-friendly software and high throughput capabilities, these systems streamline material characterization and process optimization.

X-ray reflectometry (XRR):

Our XRR systems offer advanced thin film analysis for semiconductor device fabrication. From film thickness measurement to density profiling, these tools provide critical insights into film structure and quality, enabling you to optimize deposition processes and ensure device performance.

X-ray topography (XRT):

Our XRT solutions offer high-resolution imaging of semiconductor wafers, allowing you to identify defects and crystallographic features with exceptional clarity. With automated defect detection and analysis capabilities, these systems streamline defect characterization and yield enhancement efforts.

High-resolution X-ray diffraction (HR-XRD):**

Our HR-XRD systems deliver precise measurement of lattice parameters and strain in semiconductor materials. With sub-angstrom resolution and customizable analysis capabilities, these tools enable you to optimize epitaxial growth processes and ensure device reliability.

Critical dimension small-angle X-ray scattering (CD-SAXS):

Our CD-SAXS instruments provide quantitative analysis of nanostructures and patterned features in semiconductor devices. From line edge roughness to feature size distribution, these systems offer valuable insights into lithography process performance and device functionality.

At our company, we are committed to providing innovative X-ray metrology solutions that empower semiconductor manufacturers to achieve their production goals with confidence. Whether you are conducting R&D or optimizing manufacturing processes, our tools deliver the accuracy, reliability, and efficiency you need to succeed in today's competitive semiconductor industry. Contact us today to learn more about our X-ray metrology solutions and how they can benefit your semiconductor operations.