FSAS III

Automated crystalline orientation measurement system 

For SiC, graphite, GaN, Si, Ge, GaAs, LN, LT, sapphire, etc.

From production to quality control of single crystal materials, X-ray diffraction systems for single crystal orientation and quality assurance.

FSAS III Automatic X-ray single crystal orientation measuring device

FSAS III Overview

After measuring the orientation of various single crystal materials such as Si, Ge, GaAs, SiC, quartz, LN, LT, sapphire, rutile and fluorite accurately, the FSAS III transmits the angle cutting information to the cutter (for instance, to a wire saw). The orientation verification measurement of single crystals after cutting can also be carried out automatically. No special skills are required by the operator. 

FSAS III Features

Even a novice can handle automatic determination of the cutting orientation of various single crystal materials. (Note: Depending on the sample shape, cutting method and cutter type, there may be a need to make a custom sample holder.)
Once the measuring conditions are stored in the FSAS III using a touch panel interface, the operator only has to click “Measurement Start” to conduct the automatic measurement. The measurement result will then be displayed on the screen while a hard copy is being generated.
The cut angle of a block or wafer sample can be automatically verified after cutting.
X-ray measurement and optical system alignment are automated to ensure reliable measurements
Special design consideration is given to safety, so the sample insertion door will be locked instantly at the start of a measurement. Access to the sample is provided at the end of the measurement.
The FSAS III is designed so that generated X-ray are fully confined to the system interior.

FSAS III Specifications

Technique X-ray diffraction (XRD)
Technology X-ray diffraction system for single-crystal orientation measurement of ingot and wafer
Benefit Automatic determination of the cutting orientation of various single crystal materials.
Attributes Automated X-ray and optical measurement system
Safety-centered design
Measuring conditions library
Features Custom sample holders optional to fit sample shape, cutting method and cutter type
Verification of cut angle of a block or wafer sample after cutting
Touch panel interface, one- click to conduct the automatic measurement
Auto-lock function to protect the sample integrity and the measurement accurate results
Dimensions 1300 (W) x 845 (D) x 1600 (H) mm
(Excluding the status lamp and X-ray warning lamp)
Measurement results Get the angular deviation on a lattice plane relative to a wafer.
Angular deviation of a lattice plane relative to an orientation flat (OF) of a wafer

FSAS III Events

Learn more about our products at these events

  • SEMICON SEA
    May 19 2025 - May 21 2025
    Singapore
  • EMRS Spring Meeting 2025
    May 25 2025 - May 29 2025
    Strasbourg, France
  • Leti Innovation Days 2025
    June 24 2025 - June 26 2025
    Grenoble, France
  • SOFC-XIX
    July 12 2025 - July 17 2025
    Stockholm, Sweden
  • JSAP Autumn EXPO
    September 6 2025 - September 9 2025
    Nagoya, Japan
  • The 86th JSAP Autumn Meeting 2025
    September 6 2025 - September 9 2025
    Tokyo, Japan
  • SEMICON Taiwan
    September 9 2025 - September 11 2025
    Taipei, Taiwan
  • EMRS Fall meeting 2025
    September 14 2025 - September 17 2025
    Warsaw, Poland
  • International Conference on Silicon Carbide and Related Materials (ICSCRM 2025) 
    September 15 2025 - September 18 2025
    Busan, Korea
  • SEMICON Japan
    December 1 2025 - December 2 2025
    Tokyo, Japan

Contact Us

Whether you are interested in getting a quote, want a demo, need technical support, or simply have a question, we're here to help.