Ultrathin Film Thickness

FEOL wafer processing / blanket wafer

Site comparison of 3 nm TiN layer – titanium nitride

• XRF spectra comparison of two sites of TiN, 3 nm nominal thickness.
• Ultrahigh sensitivity to thickness variation of down to 1 Å was demonstrated.
• The titanium peak was measured.

2 Sites – titanium nitride film

Repeatability vs. Across-wafer variation – cobalt

• These graphs represent the process variation and tool precision of ultrathin film of cobalt.
• The layer thickness is 3 nm.
• The error bars represent 1σ error, based on 10 repetitions.

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ONYX 3000

EDXRF and optical hybrid metrology tool for automated X-ray analysis, 3D scanning, and 2D microscope for film thickness and composition measurements on blanket and patterned wafers for up to 300 mm wafers

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