About RIT

Rigaku facilities

Rigaku’s Auburn Hills manufacturing and design facilities are tailored to the production of EUV optics. Over $9M has been invested in major expansions for EUV research and development, deposition equipment and facility upgrades, including:

Deposition 5 state-of-the-art ultra-high vacuum inline systems 10 total sputter-deposition systems located in 2 separate cleanrooms Optics up to 1.5 meter in length or 0.75 meter diameter Up to 9 target materials in a single deposition Ion-milling capability for substrate decontamination
Metrology Custom purpose-built X-ray reflectivity for probing multilayer structure Strategic partnerships with the major synchrotron-based EUV metrology centers (CXRO, NIST, PTB, New Subaru) Veeco/Dimension atomic force microscope (AFM) for surface topology and roughness Zygo NewView interferometric microscope Custom purpose-built curvature & figure measurement Future-fab cleaning bench & support systems
Design & Manufacturing Optical ray-tracing design & analysis Team of mechanical designers In-house machine shop

History of EUV & EUVL at Rigaku

With 25+ years experience in multilayer coatings for EUV optics, Rigaku demonstrates success in every facet of EUV multilayers, coatings and designs. Rigaku, formerly Osmic Inc., was at the forefront of the history of EUVL development, developing the multilayers for some of the very first imaging optics and mask blanks, and has continued with world-class contributions ever since.

The timeline below shows Rigaku’s history of EUV contributions, highlighting the various optics and various multi-optic systems.