XTRAIA MF-3000-R
Non-destructive microspot multipurpose X-ray metrology tool. Advanced measurements for multilayer films, EUV masks, and semiconductor applications.
- Combines XRR, XRF, and XRD in one tool
- Microspot measurement from 20–85 µm
- Compatible with patterned and blanket films
- Supports EUV mask characterization
The XTRAIA MF-3000-R is a multifunction metrology system combining reflectometry (XRR), fluorescence (XRF), and diffraction (XRD) technologies. It delivers precise analysis of thickness, composition, density, and crystallinity. Its microspot beam configurations and dual-detector architecture support detailed evaluations of EUV masks and semiconductor thin films.
This tool is suited for advanced process development and production control, offering SEMI-compliant safety standards and flexible automation features.
XTRAIA MF-3000-R Overview
The XTRAIA MF-3000-R is a high-precision metrology tool designed for thin-film characterization. It combines advanced X-ray reflectometry (XRR), X-ray fluorescence (XRF), and X-ray diffraction (XRD) for thickness, density, roughness, and crystallinity measurements. This tool is ideal for demanding semiconductor and EUV mask evaluations.
XTRAIA MF-3000-R Features
XTRAIA MF-3000-R Specifications
| Technique | XRR, EDXRF, XRD | |
|---|---|---|
| Sensitivity | Sub-nanometer to micron thickness | |
| Sample compatibility | EUV masks, blanket/patterned substrates | |
| Measurement items | Film thickness, density, composition, roughness | |
| Resolution | High spatial and material resolution | |
| Benefit | Comprehensive film evaluation in a single tool | |
| Automation | Recipe-based operation with safety compliance | |
| Technology | Theta-theta goniometer, HyPix and SDD detectors | |
| Compliance | SEMI S2/S8, GEM300, CE, NFPA, EU directives | |
| Throughput | High-throughput, automated mapping | |
| Core attributes | High-accuracy, micro-spot targeting | |
| Core features | Real-time analysis of density, crystallinity, thickness | |
| Options | GEM300 support, E84/OHT interface | |
| Measurement results | Multi-parameter film data for QA/QC and development | |
XTRAIA MF-3000-R Options
- GEM300 software
- OHT integration
- Application-specific configuration kits
The following accessories are available for this product:
XTRAIA MF-3000-R Events
Learn more about our products at these events
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EventDatesLocationEvent website
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SPIE Advanced Lithography + PatterningFebruary 22 2026 - February 26 2026San Jose, CA, USA
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Florida Semiconductor SummitFebruary 23 2026 - February 25 2026Orlando, FL, USA
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Rigaku Taiwan professional training courses (SCX)February 26 2026 - February 26 2026Rigaku Taiwan (RTC-TW)
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JSAP Spring Meeting 2026March 15 2026 - March 16 2026Tokyo, Japan
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The 2026 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) Platinum SponsorsMarch 16 2026 - March 19 2026Monterey, CA ,USA
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SEMICON China 2026March 25 2026 - March 27 2026SNIEC, Shanghai, China
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Rigaku Taiwan professional training courses (XRD)March 27 2026 - March 27 2026Rigaku Taiwan (RTC-TW)
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CS International 2026April 20 2026 - April 22 2026Brussels, Belgium
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SEMICON SEA 2026May 5 2026 - May 7 2026Kuala Lumpur, Malaysia
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ASMC – Advanced Semiconductor Manufacturing ConferenceMay 11 2026 - May 14 2026Albany, NY, USA
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WOCSDICE/EXMATEC 2026May 24 2026 - May 28 2026Gdańsk, Poland
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The 2026 IEEE 76th Electronic Components and Technology ConferenceMay 26 2026 - May 29 2026Orlando, Fl, USA
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CEIA Leti Innovation DaysJune 23 2026 - June 25 2026Maison Minatec, Grenoble, France
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The International Workshop on Gallium Oxide and Related Materials (IWGO-6)August 2 2026 - August 7 2026College Park, MD, USA.
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SEMICON Taiwan 2026September 2 2026 - September 4 2026Taipei, Taiwan
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ICSCRM Japan 2026 (Silver Sponsor)September 27 2026 - October 2 2026Yokohama, Japan
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SEMICON West 2026October 13 2026 - October 15 2026San Francisco, CA, USA
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SEMICON EuropaNovember 10 2026 - November 13 2026Munich, Germany
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SEMICON Japan 2026December 9 2026 - December 11 2026Tokyo, Japan
XTRAIA MF-3000-R
Contact Us
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