TXRF 310Fab-R
Advanced tool for ultratrace elemental contamination analysis
- Detects ultra-trace elemental contamination
- Fully automated and fab-compatible
- Supports process control in semiconductor manufacturing
- Non-destructive surface analysis
The TXRF 310Fab-R offers highly sensitive detection of surface contamination using total reflection X-ray fluorescence (TXRF). Designed for both research and high-volume semiconductor environments, it delivers accurate, repeatable measurements for process monitoring and defect reduction.
With full SECS/GEM integration and a 3-beam optical configuration, the system ensures efficient throughput and is compliant with global safety and environmental standards. It supports spatial mapping and automated diagnostics, enabling continuous yield improvement.
TXRF 310Fab-R Overview
The TXRF 310Fab-R is an advanced metrology tool designed for ultra-trace elemental contamination analysis on semiconductor materials. It offers non-destructive analysis while maintaining sample integrity, making it ideal for laboratory research and high-throughput semiconductor fabrication. This tool provides precise contamination diagnostics to improve process monitoring and yield optimization and is engineered to meet international regulatory standards for safe global deployment.
TXRF 310Fab-R Features
TXRF 310Fab-R Specifications
| Technique | Total reflection X-ray fluorescence (TXRF) | |
|---|---|---|
| Sensitivity | Al <2.5E11 atoms/cm², Ni <1E9 atoms/cm² | |
| Sample compatibility | Wafers, photomasks | |
| Measurement items | Surface elemental contamination | |
| Resolution | Trace level quantification | |
| Benefit | Rapid diagnostics for contamination control | |
| Automation | Fully automated with fab communication support | |
| Technology | 3-beam system, automatic optics exchange | |
| Compliance | CE, NFPA, EU directives, GEM300, SEMI S2/S8 | |
| Throughput | High-throughput mapping and monitoring | |
| Core attributes | Recipe-based operation, consistent repeatability | |
| Core features | Real-time diagnostics, high-sensitivity detection | |
| Options | E84/OHT support, advanced mapping tools | |
| Measurement results | Elemental maps, trace-level spectra | |
TXRF 310Fab-R Options
- Extended mapping resolution
- Custom holders for non-standard substrates
- Enhanced reporting tools
The following accessories are available for this product:
TXRF 310Fab-R Events
Learn more about our products at these events
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EventDatesLocationEvent website
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JSAP Autumn EXPOSeptember 6 2025 - September 9 2025Nagoya, Japan
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The 86th JSAP Autumn Meeting 2025September 6 2025 - September 9 2025Tokyo, Japan
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SEMICON TaiwanSeptember 9 2025 - September 11 2025Taipei, Taiwan
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EMRS Fall meeting 2025September 14 2025 - September 17 2025Warsaw, Poland
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International Conference on Silicon Carbide and Related Materials (ICSCRM 2025)September 15 2025 - September 18 2025Busan, Korea
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SEMICON JapanDecember 1 2025 - December 2 2025Tokyo, Japan
Contact Us
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