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EUV/XUV Multilayers and Coatings

EUV & XUV refers to Extreme Ultraviolet radiation: wavelengths of 2-200 nm, or equivalently energy of 6-600 eV. EUV multilayers are designed and manufactured to provide the highest reflectivity for 13.5 nm or 91.8 eV for both lithography and metrology.

Rigaku Innovative Technologies (RIT) is a supplier of the full range of extreme ultraviolet (EUV) multilayers and coatings for optics with over 30 years’ experience, and participates in the global research and infrastructure-development of the commercial EUVL (EUV lithography) implementation to support the continued scaling of computer chip circuitry.

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EUV - XUV Wavelengths (graphic06-no header)

EUV products

RIT has proven expertise & capability to address any application or design requirement, with customized multilayer designs to meet the unique requirements of the optical system. RIT is a global provider of EUV Collectors, Illumination and Imaging optics with demonstrated world-class results in nearly every class of EUV optics.

  • Large production capability with load-locked deposition chambers, handling linear sizes up to 1.5 m x 0.5 m and diameters up to 750 mm
  • High peak reflectivity, uniformity, 1D & 2D d-spacing profile precision as low as ± 0.005 nm rms
  • Standard materials include: Mo/Si, La/B, La/B₄C, Ru/B₄C, Mo/B₄C, W/C, Cr/C, Cr/Sc, Al₂O₃/B₄C
    Capping layers include: SiO₂, Ru, TiO₂, ZrO₂

Learn more about RIT's EUV technologies and capabilities

Read some of RIT's success stories with EUV multilayers and coatings.

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Whether you're interested in getting a quote, want a demo, need technical support, or simply have a question, we're here to help.

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