Confocal Max-Flux
Custom Focusing CMF X-ray Optics
For X-ray diffraction and related instrumentation
Rigaku's family of Confocal Max-Flux (CMF) optics offers the best performance of any two dimensional beam conditioning optics available today. CMF Optics are considered by many to be the most significant advancement in X-ray optics in the last decade. By utilizing two laterally graded multilayers in a side-by-side arrangement, Rigaku improves on all the parameters of previous optical arrangements used for manipulating a X-ray beam in two dimensions.
Confocal Max-Flux Overview
Confocal Max-Flux side-by-side geometry
Rigaku’s Confocal Max-Flux optic combines two Max-Flux graded multilayer optics to collimate or focus a beam in two dimensions.
Divergence of the reflected beam will be the same in both directions for parabolic mirrors. Magnification will also be the same in both directions for elliptically-curved mirrors.
Monochromatize while simultaneously achieving one of the following:
- Focus a beam from one point to another—a significant increase in monochromatic flux density at the focal point
- Collimate a beam from a point source to illuminate a specific area
- Focus a parallel beam—a significant increase in monochromatic flux density at the focal point
Confocal Max-Flux optics provide the highest flux, cleanest spectrum and most uniform beam profile of any multilayer optics available today. Customizable bandwidth can be achieved by configuring the optic and multilayer parameters.
Applications
- Protein crystallography
- Small molecule crystallography
- Thin film analysis
- SAXS
- Biotechnology
- High-resolution diffraction
- Micro-focusing for both point-focus lab sources and synchrotrons
- Micro-crystallography
- High pressure applications
Improved optical configuration
For many applications, the side-by-side geometry of Rigaku's Confocal Max-Flux Optics solves problems inherent in both traditional optical schemes and cross-coupled multilayer optical schemes. Both mirrors are arranged at the most appropriate location for optimizing optical performance. Magnification from both mirrors will be the same.
Greatly improve your instrument
- Quicker and easier beam alignment
- Flux increases with greatly decreased background
- Shortening data collection time
- Decreased beam divergence
- Improved resolution
Custom designs made routinely
Elliptical mirrors can be designed to focus a beam at either the sample or detector. The diffraction spot can be designed to match the detector resolution. Therefore, the resolution and angular range of the measurement can simultaneously be improved. Focusing increases flux density, resulting in better contrast.
Confocal Max-Flux with Arc)Sec technology
When the highest optical precision is required, proprietary Arc)Sec technology is combined with Confocal Max-Flux optics to provide multilayer optics with < 4 arcsec precision in optical figure. Arc)Sec Confocal Max-Flux optics provide increased flux and decreased background with very uniform beam profiles, capable of achieving beam spots under 5 microns diameter.
When paired with Rigaku’s MicroMax-003 X-ray source and a PSR scatter-free pinhole, the X-ray beam can be further and more accurately defined thus increasing the flux throughout your analytical instrument.
Confocal Max-Flux Features
Confocal Max-Flux Specifications
Technique | For X-ray diffraction, single crystal, SAXS, micro-XRF and related instrumentation | |
---|---|---|
Benefit | High flux and controlled divergence | |
Technology | Multilayer confocal optics, nested K-B mirrors | |
Attributes | Excellent Kα/Kβ ratio | |
Options | Various focal lengths; custom designs |
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