XRR Plugin

X-ray reflectivity analysis software for a wide range of applications

From simple film thickness analysis to detailed multilayer structure analysis

• Flow bar guides user and provides necessary analysis steps to complete
• Oscillation analysis helps modeling the sample structure
• Density profile is graphically displayed across sample thickness
• Segmented measurement ranges maximize dynamic range of the data
• Simultaneous fittings on more than two data sets measured by different resolutions to extract one sample structure that includes largely different thicknesses

The reflectivity plugin is for the analysis of X-ray reflectivity measurement data. It allows analysis of layer thickness, density, and surface/interface roughness of various multilayer thin films. Using a flow bar interface shared by other plugins, even a beginner unfamiliar with the procedure for reflectivity analysis can perform professional-level data analysis by following a specified flow.

In reflectivity analysis using conventional nonlinear least-squares methods, a local minimum can be obtained as a solution. In this case, the final solution changes depending on the initial analysis model or on the operator’s skill. The reflectivity plugin performs analysis independent of initial models or operators by using the latest fitting algorithm that automatically searches many solutions.

Latest fitting algorithm

Use of a genetic algorithm customized for reflectivity analysis to find a true solution (a global minimum) minimizes operator dependence. In addition, use of the algorithm helps determine a solution even when the initial model greatly deviates from the final solution.

Dual-fitting algorithm

For more precise analysis, the plugin incorporates a dual-fitting algorithm (genetic algorithm and least-squares method). After finding a global minimum by the genetic algorithm, the least-squares method is used for further precise fitting analysis. In the analysis, the precision can be improved by setting upper and lower limits on the film structure parameters and applying various constraints on the parameters.

Extended Fourier film thickness analysis

Extended Fourier film thickness analysis provides rough information about the film thickness without performing a fitting analysis. Moreover, applying the obtained rough data of the film thickness to a fitting model, one can create an initial model in a form close to a final solution, which can shorten the analysis time.

A variety of modeling functions

The software allows setting both the density gradient in a single layer and the density and film thickness gradients for a superlattice structure. These can be applied to the analysis of a complicated structure such as interface diffusion or non-uniform multilayer films.

More accurate analysis can be performed by setting a model of the X-ray optical system used for the measurement to account for the resolution of the system in the fitting analysis. Sample parameters obtained from the analysis can be saved for use in subsequent analyses. By doing so, the analysis of a complicated film structure can be started smoothly.