Electronics
Rigaku's advanced analytical technology provides proven material analysis, identification, and quantitation, helping you create safe, efficient, and trustworthy electronic devices.
Industry challenges
Electronics research & quality control
Wafer fabrication
Before growing the film, evaluate grains and crystal defects in the mono-crystal substrate for optimum device performance.
Learn more >Film growth, electrode deposition
Our high-resolution and high-speed X-ray diffraction systems are capable of independently determining the critical parameters of crystalline perfection and thickness of thin-film layers which directly impact device performance with high-precision.
Learn more >Dicing and packaging
To measure the individual components of a chip, an instrument capable of analyzing small regions of a semiconductor device is needed. By employing an X-ray diffraction system with micro-focus optics, along with a high-speed 2D detector, quick and accurate measurements of micro-areas with high intensity can be carried out.
Learn more >Printed circuit boards (PCBs)
X-ray imaging is an essential method to non-destructively visualize the inner structure and defects of a single chip on a PCB by using 3D volume reconstruction and 2D slice rendering.
Learn more >Products for the electronics industry
XRTmicron (Lab)
XRT (X-ray topography) imaging system for emerging power electronics, optoelectronics, and 5G / 6G communications (SiC, GaN, GaAs, InP, Ga₂O₃) for up to 300 mm wafers
Learn moreSmartLab
Advanced, state-of-the-art, high-resolution XRD system powered by Guidance expert system software
Learn moreApplications
The future of electronics research and quality control with our proven analytical technology
Crystal defects
When producing high-performance semiconductor devices, crystalline defects in epitaxial thin films can cause problems. For instance, when thin films are grown epitaxially, they may inherit crystal defects from the single crystal substrate. Therefore, it is crucial to assess the grains and crystal defects within the single crystal substrate before film growth to ensure optimal device performance.
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Crystal quality
X-ray rocking curve measurement is a method used to evaluate the crystal quality of both crystalline films and mono-crystal substrates. The width of the peak (FWHM) of the measured rocking curve profiles provides information about the orientation distribution of crystal lattice planes (mosaic spread) within the sample. This orientation distribution can be used as a measure of the sample's perfection. Rigaku’s SmartLab diffractometer, with its high-resolution beam conditioner, provides the necessary resolution to determine the perfection of high-quality crystalline films and substrates.
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Lattice constants
Triple-axis X-ray geometry combined with a highly accurate goniometer can enable ultra-high resolution diffraction analysis of single-crystalline substrate wafers. The term "triple axis" refers to three independent crystalline diffraction components. The sample forms one axis, while the other two axes are associated with the incident and diffracted beam channel-cut multi-bounce monochromator crystals. By using an XY mapping stage, the variability of the crystalline lattice parameter can be evaluated across a single-crystal wafer.
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Orientation analysis
Organic semiconductors are a highly promising class of materials for the next generation of semiconductors. They are cost-effective and exhibit superior characteristics compared to conventional inorganic materials. The arrangement and orientation of molecules are critical to the properties of organic semiconductors. In this example, we highlight the benefits of using in-plane X-ray diffraction (XRD) to evaluate the orientation of a copper phthalocyanine (CuPc) thin film. This material is photoconductive and electroluminescent, making it a valuable organic material for various applications.
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Curvature
Differences in thermal expansion between epitaxial films and their associated single-crystal substrates can cause the samples to warp. The extent of the induced curvature can be evaluated by analyzing X-ray rocking curve mapping data that is collected using an XY translation stage. Understanding the degree of curvature can serve as an indicator of residual stress within the film.
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Dicing and packaging
The SmartLab μHR is an advanced system that can analyze the crystalline state of micro-parts like printed circuit boards. It uses a micro-focus X-ray source and high-speed 2D X-ray detector to perform high contrast micro-area measurements in a shorter amount of time compared to earlier systems that employed X-ray optics consisting of slits and collimators.
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Printed circuit boards
X-ray micro CT (Computed Tomography) is a technique used to produce a high-resolution 3D image of a very small object. This is done by reconstructing projection images of X-rays that are transmitted through the object. The reconstructed image can be displayed in 2D cross-sections (slices) and 3D volume renderings, allowing for non-destructive analysis of the object's inner structure and defects.
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Micro-area mapping
To analyze micro-size parts such as PCBs, it's crucial to evaluate the crystalline state of each part. Traditional optical systems needed to convert divergent X-ray beams into a focused beam, which took a long time due to the large attenuation of the X-ray beam intensity. However, with the SmartLab μHR and a high-speed 2D X-ray detector, it's possible to achieve a high-intensity micro-area measurement in a short time, even with 1/10 of the X-ray generator output.
Learn more >Application Notes
The following application notes are relevant to electronic devices
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RSMD002 - Thickness Characterization of a Power Device Backside Electrode
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B-XRD3007 - Tri-axial Stress Analysis of a Multilayer Ceramic Capacitor (MLCC)
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B-XRD3005 - Evaluation of Residual Stress of Thin Films by GI-XRD and the Multiple hkl Method
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B-XRD2034 - Twist Width Evaluation of Group III-V Nitride Films by Rocking Curve Measurement
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B-XRD2031 - Evaluation of Curvature of a Single Crystal Substrate by Rocking Curve Measurement
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B-XRD2030 - Evaluation of Uniformity of Thin Film Thickness by X-ray Reflectivity Mapping
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B-XRD2028 - Off-normal Fiber Texture Analysis by Pole Figure Measurement
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B-XRD2027 - Evaluation of Uniformity of a Single Crystal Substrate by Rocking Curve Measurement
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B-XRD2026 - Analysis of Epitaxial Films on In-plane Anisotropic Substrates by Wide-Range RSM
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B-XRD2025 - Analysis of Uniaxially Oriented Film by Wide-range RSM
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B-XRD2024 - High-speed RSM of a III-nitride Epitaxial Film by 1D Detection Mode
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B-XRD2023 - Phase Identification of an Organic Thin Film by GIWAXS Measurement with a 2D detector
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B-XRD2022 - Crystal Defect Analysis by X-ray Reflection Topography
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B-XRD2021 - High-speed RSM of an Epitaxial Film by 1D Detection Mode
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B-XRD2020 - Phase ID and Orientation Analysis for Thin Film SOFC Material using 2DD
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B-XRD2009 - Orientation Analysis of Organic Thin Film on Single Crystal Sub by In-plane XRD
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B-XRD2007 - Examination for Growth Process of Organic Thin Film by In-plane XRD
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B-XRD2006 - Crystal Orientation Evaluation of Epitaxial Film and Ultrathin Buffer Layers by In-plane Reciprocal Space Mapping
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B-XRD2005 - Orientation Analysis of Organic Thin Film on Rubbed Glass by In-plane XRD
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B-XRD2003 - Magnetic Recording Media (FePt) by In-plane XRD
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B-XRD2001 - Evaluation of Crystal Quality (Tilt and Twist Qidths) of Group-III Nitride Film by the Rocking Curve Method
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B-XRD1170 - Phase Identification of a Black Foreign Material on a Sintered BaTiO₃ Ceramic using Micro-area X-ray Diffraction
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B-XRD1149 - Evaluation of Barium Titanate Polymorphs by Rietveld Analysis
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B-XRD1113 - Evaluation of Oxidation State by the BVS Method
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B-XRD1110 - Particle Size Distribution Analysis of Ferroelectric Nanopowder by USAXS
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B-XRD1109 - Structure Determination of Ferroelectric Nano-powder by PDF Analysis
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B-XRD1089 - Micro-area Mapping Measurement of Printed Circuit Boards
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B-XRD1018 - Crystallite Size Distribution of Zinc Oxide Nanoparticles
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B-TA1081 - TG‑DTA Evaluation of Epoxy Resin Using Sample Observation Function
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B-TA1070 - Thermal History Of Electrical Wire Insulating Sheath Polymer
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