Unique Variable-angle GI-XRF Capability

Application Note B-XRF3003

Introduction

An incident X-ray beam impinges upon the sample at a shallow angle resulting in virtually complete reflection of the excitation beam away from the silicon drift detector (Figure 1). This affords dramatically reduced background contributions in the measured energy dispersive X-ray fluorescence spectra. Furthermore, it is possible to obtain information depending on measuring depth with GI-XRF capability. 

B-XRF3001 Figure 1 TXRF principle
Figure 1: TXRF principle

Measurement and results

In this example, a 25 nm nickel (Ni) thin film on a glass substrate was measured at two different incident angles: 0.02° and 0.40° (Figure 2). The results of the measurement are shown in Figure 3. Incident angle 0.02° is under condition of TXRF and then only the surface information is obtained. On the other hand, angle 0.40° is higher than the critical angle then it is possible to measure deeper area beneath the surface.

B-XRF3003 Figure 2 Nickel coated sample

Figure 2: Nickel coated sample


Only Ni was strongly excited at 0.02° GI (Grazing Incidence) excitation condition (blue spectrum). However, elements included in the glass substrate are strongly exited at the higher 0.40° angle (red spectrum) because X-rays penetrate more deeply into the substrate. It is possible to change incident angle arbitrarily, and then the characterization of the solid surface can be done by using this function.

B-XRF3003 Figure 3 Spectra of the Ni thin film (25 nm) for differenct incident anglesFigure 3:  Spectra of the Ni thin film (25 nm) for different incident angles 

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