An incident X-ray beam impinges upon the sample at a shallow angle resulting in virtually complete reflection of the excitation beam away from the silicon drift detector. This affords dramatically reduced background contributions in the measured energy dispersive X-ray fluorescence spectra. Ultra-trace elemental analysis of the liquid sample becomes possible using the NANOHUNTER II and “Drop and Dry” sample preparation technique.
The new, next generation benchtop total reflection X-ray fluorescence (TXRF) spectrometer
Trace elemental surface contamination metrology by TXRF; up to 200 mm wafers.
Trace elemental surface contamination metrology by TXRF; up to 300 mm wafers
Ultra-trace elemental surface contamination metrology by TXRF with VPD capability; up to 300 mm wafers