What is Total Reflection X‑ray Fluorescence (TXRF)?
Total reflection X-ray fluorescence (TXRF) spectroscopy is a method by which an incident beam of X-rays just grazes the sample, delivering low-background noise, high-sensitivity measurement of ultra-trace elements. This affords dramatically reduced background contributions in the measured X-ray fluorescence spectra.
By efficiently exciting the surface elements, while virtually eliminating the background noise, the TXRF technique affords extremely high signal-to-noise performance resulting in ultra-trace elemental measurement sensitivity.
The technique is frequently used to detect trace impurities on the surface of mirror-polished substrates (such as silicon wafers or a thin film surface on silicon wafers), but it can also be used to conduct elemental analysis down to ppb levels for liquids, such as factory waste and effluent streams. For these experiments, a drop of liquid is added to a sample carrier then dried. Quantitative analyses using internal standard substances can also be easily performed.
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