Rigaku at SPIE Advanced Lithography + Patterning 2025

Driving precision in advanced lithography: Metrology solutions from Lab to Fab

Plan your visit to Booth #501!​

Click here to schedule a meeting with our team or learn more about our presentations and solutions.

Why visit Rigaku?​

Explore cutting-edge metrology solutions for advanced lithography. From inline X-ray metrology to hybrid measurement techniques, discover how Rigaku is driving precision in semiconductor manufacturing.​

Key highlights:​

• Improve yield with high-precision metrology​
• Enhance mask handling efficiency with X-ray solutions​
• Ensure reliability in semiconductor fabrication
• Connect with our team of experts to discuss tailored solutions

Technical presentation schedule

Conference presentation

Hybrid metrology for non-destructive lateral cavity etch measurements of 8-superlattice layer nanowire test structures (NWTS) using optical Mueller matrix spectroscopic ellipsometry (MMSE) and X-ray diffraction (XRD) and X-ray reflectivity (XRR).

February 26, 2025 • 8:30 AM - 8:50 AM PST | Convention Center, Grand Ballroom 220B

Conference presentation

3D-DRAM Si/SiGe superlattices: Inspection strategies and evaluation

February 26, 2025 • 10:10 AM - 10:40 AM PST | Convention Center, Grand Ballroom 220B 

Conference presentation

Inline X-ray metrology for complementary field-effect transistors (CFET)

February 26, 2025 • 5:10 PM - 5:30 PM PST | Convention Center, Grand Ballroom 220B

Conference presentation

Non-destructive sub-nanometer evaluation of sidewall coverage in deep holes by small-angle X-ray scattering

February 26, 2025 • 5:30 PM - 7:00 PM PST | Convention Center, Hall 2