Max-flux TXRF

Focusing Graded Multilayer Monochromator

Maximizes intensity on the sample within the total external reflection angle for TXRF

Introduced by Rigaku Innovative Technologies in the early 1990’s, graded multilayer monochromators provide increased intensity and decreased background for Total Reflection X-ray Fluorescence Spectrometry.

Max-flux TXRF Overview

Max-flux® Optics use graded multilayers, assuring the same X-ray energy diffracts from every point along the surface of the elliptical optic. Rigaku’s Osmic® Coating technology provides results in less than 0.5% d-spacing variation. Such high precision means more flux is available for your experiment. Optical precision is also critical to good performance. Using proprietary technology, standard Max-flux optics are made within ~10 arcsec of the ideal curve. When the best performance is required, Rigaku applies new Arc)Sec® technology to achieve optical precision of ≤4 arcsec

Max-flux TXRF Features

Easy alignment
Increased intensity on sample
Greatly decreased background, especially from spurious lines from the X-ray source
Excellent control of X-ray beam profile and divergence
Improved data collection
Available for Cu, Mo, Co, Ag, Au, Cr, W Kα, W Kβ and other X-ray energies

Max-flux TXRF Specifications

Technique For Total Reflection X-ray Fluorescence spectrometry
Benefit Increased intensity on the sample
Technology Multilayer elliptical optics
Attributes Excellent Kα/Kβ ratio
Options Custom designed

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