非常溫常壓環境條件下的X光繞射（XRD）適用於多種應用領域，尤其是原位動態過程表徵——例如固態反應機理、相變過程追蹤、晶粒生長以及熱膨脹等。XRD是對傳統熱分析技術（如熱重分析、差示掃描量熱法等）的重要輔助，能同步提供材料在變溫過程中的物相鑑定、織構分析與晶粒尺寸等關鍵結構訊息。
產品 | 應用說明
以下是與該技術相關的應用說明
BATT1018 - XRD Measurement with Temperature Control and Charge/Discharge Using Laminated Cells
B-XRD2039 - Observation of Anisotropic and Nonlinear Thermal Expansion of Thin Films on Substrates by In-Plane X-ray Diffraction
B-XRD1169 - Temperature-dependent Analysis of Polymer Crystallization Behavior Using High-speed Time-resolved Measurement
B-XRD1133 - Observation of Phase Transition Behavior of Pharmaceutical Materials with a Benchtop XRD System
B-XRD1117 - Observation of a Phase Transition at High Temperature under Various Atmospheres
B-XRD1105 - High-speed in-situ Measurement of Melting Process of Metal
B-XRD1101 - High-T analysis - MiniFlex with HyPix-400 MF / BTS 500
B-XRD1011 - Temperature Dependence of a Lattice Constant
無論您是需要報價、產品示範、技術支援或是有任何需要諮詢的相關問題，我們可隨時為您提供協助。
