Every aspect of modern life benefits from coating or thin film technology. Whether analyzing a barrier layer film in an integrated circuit chip or a conversion coating on an aluminum beverage can, X-ray analytical techniques are integral to R&D, production process control and quality assurance of such materials. Composition and structure of coatings, thin films, multilayers, materials, solar cells, batteries, semiconductors, nanomaterials and many other materials can be analyzed by X-ray fluorescence (XRF) to determine the thickness and elemental composition in metrology. XRT (X-ray topography) can be employed to investigate crystalline defects and X-ray Reflectometry (XRR) to measure layer thicknesses, roughness and interlayer diffusion. Emerging as a leading enabler for such thin film and nanotechnology research, X-ray diffraction (XRD) and associated diffuse scattering methods like SAXS examine the nature of the molecular structure of films, coatings and layers or particles in biology, chemistry, physics, and engineering. Rigaku’s advanced technology and experience provide a variety of non-destructive and state-of-the-art analytical solutions and service.
Benchtop tube below sequential WDXRF spectrometer analyzes O through U in solids, liquids and powders
High power, tube below, sequential WDXRF spectrometer with Smart Sample Loading System (SSLS)
High power, tube above, sequential WDXRF spectrometer with new ZSX Guidance expert system software
High power, tube above, sequential WDXRF spectrometer
WDXRF spectrometer designed to handle very large and/or heavy samples
High-throughput tube-above multi-channel simultaneous WDXRF spectrometer analyzes Be through U