High-resolution X-ray Diffraction
High-resolution X-ray diffraction (HRXRD) is a powerful technique used for research and manufacturing of semiconductors. It has several advantages such as assessing crystal quality, analyzing layer thickness and composition, evaluating interface quality, analyzing strain, optimizing processes, detecting and analyzing defects, developing advanced materials, and quality control in manufacturing. HRXRD plays a vital role in advancing semiconductor technology.
HRXRD metrology solutions
From lab to fab
XTRAIA XD Series
HIGH-RESOLUTION XRD
EPITAXIAL FILM CHARACTERIZATION
HR-XRD and XRR. Strain, composition, and thickness of epitaxial layers, crystalline phase, and texture of polycrystalline films. Thin film and film stack thicknesses and density.
TFXRD Series
Description In-line monitoring and control using X-ray diffraction for analyzing thin film properties.
HRXRD advantages
Crystal quality assessment
Characterize crystal quality, including crystal structure, lattice parameters, and crystal defects.
Layer thickness and composition analysis
Determine layer thicknesses and compositions in semiconductor heterostructures, including epitaxial layers and multilayer structures.
Strain analysis
Analyze strain with high sensitivity in semiconductor materials to improve carrier mobility in field-effect transistors (FETs) and enhance the efficiency of optoelectronic devices.
Interface quality evaluation
Provide insights into the quality of interfaces between different semiconductor layers
Defect analysis and detection
Identify and characterize various types of defects in semiconductor materials, including threading dislocations, stacking faults, and point defects.
Advanced material development
Develop avanced semiconductor materials, such as III-V compound semiconductors and wide-bandgap materials for next-generation devices.
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